Method of making a connection component with posts and pads

ABSTRACT

A packaged microelectronic element includes connection component incorporating a dielectric layer ( 22 ) carrying traces ( 58 ) remote from an outer surface ( 26 ), posts ( 48 ) extending from the traces and projecting beyond the outer surface of the dielectric, and pads ( 30 ) exposed at the outer surface of the dielectric layer, the pads being connected to the posts by the traces. The dielectric element overlies the front surface of a microelectronic element, and contacts ( 74 ) exposed on the front surface of the microelectronic element are connected to the pads by elongated leads ( 76 ) such as wire bonds. Methods of making the connection component are also disclosed.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a division of U.S. patent application Ser.No. 11/166,982, filed Jun. 24, 2005, issued as U.S. Pat. No. 7,495,179,which is a continuation-in-part of U.S. patent application Ser. No.10/959,465, filed Oct. 6, 2004, issued as U.S. Pat. No. 7,462,936, whichapplication claims the benefit of the filing dates of U.S. ProvisionalPatent Application Nos. 60/533,210, 60/533,393, and 60/533,437, all ofwhich were filed Dec. 30, 2003; and U.S. Provisional Patent ApplicationNo. 60/508,970 filed Oct. 6, 2003. The present application also claimsthe benefit of the filing date of U.S. Provisional Patent ApplicationNo. 60/583,109, filed Jun. 25, 2004, the disclosure of which is herebyincorporated by reference herein.

BACKGROUND OF THE INVENTION

The present invention relates to components and assemblies useful inmicroelectronic assemblies, to assemblies incorporating such componentsand to methods of making such components.

Microelectronic elements such as semiconductor chips typically areprovided in packages which protect the semiconductor chip itself fromthe external environment and which facilitate mounting the chip on acircuit board. For example, some microelectronic packages include aconnection component incorporating a dielectric element such as a boardor sheet having top and bottom surfaces and having electricallyconductive terminals exposed at the bottom surface. The chip is mountedto the top surface and connected to the terminals by variousarrangements such as electrically conductive traces extending on asurface of the dielectric element, or within the dielectric element. Thechip typically has a front surface with small contacts thereon and anoppositely-facing rear surface. The chip may be mounted in a face-downarrangement, so that the front surface of the chip confronts the topsurface of the dielectric element and the rear surface of the chip facesupwardly, away from the dielectric element. In other cases, the chip maybe mounted in a face-up arrangement, with the rear surface of the chipfacing downwardly toward the top surface of the dielectric element. Thecontacts on the front face of the chip typically are connected to thetraces on the dielectric element either by direct bonds between thecontacts and leads formed integrally with the traces, or by wire bonds.As disclosed, for example, in U.S. Pat. No. 6,177,636, the disclosure ofwhich is incorporated by reference herein, similar chip packages can bemade with terminals in the form of posts projecting from the bottomsurface of the dielectric element. The posts can be fabricated using anetching process. As disclosed in commonly assigned, co-pending U.S.Provisional Patent Applications 60/533,210; 60/533,393; and 60/533,437,all filed Dec. 30, 2003, the disclosures of which are incorporated byreference herein, packages utilizing posts can provide numerousadvantageous features. For example, the posts and the dielectric layeror layers can be configured to promote tilting of the posts when thetips of the posts are engaged with a test socket, to facilitate effectedcontact between the tips of the posts and the contacts of the testsocket.

Efforts have been made to fabricate electronic connection structuressuch as individual layers for multi-layer circuit boards using ametallic post structure. In one process, disclosed by the NorthCorporation of Tokyo, Japan, a metallic plate is etched to form numerousmetallic posts projecting from the plate. A dielectric layer is appliedto this plate so that the posts project through the dielectric layer. Aninner or upper side of the dielectric layer faces upwardly toward themetallic plate, whereas the outer or lower side of the dielectric layerfaces downwardly towards the tip of the posts. The dielectric layer maybe fabricated by coating a dielectric such as polyimide onto the platearound the posts or, more typically, by forcibly engaging the posts withthe dielectric sheet so that the posts penetrate through the sheet. Oncethe sheet is in place, the metallic plate is etched to form individualtraces on the inner side of the dielectric layer extending to the basesof the various posts.

The components made by this process suffer from certain drawbacks foruse as connection components in certain types of semiconductor chippackages. For example, it is often desirable to mount a chip in aface-down orientation and connect the contacts on the chip to the tracesof the connection component using wire bonds which extend from the chipthrough a large opening or slot in the dielectric element, or around theedges of the dielectric element, and approach the outer or bottomsurface of the dielectric element. Such a wire bond can be formed in asimple, one-step bonding operation. However, in the aforementionedprocess, the traces are formed on the inner or upper side of thedielectric element. Therefore, the traces are not exposed for makingsuch a simple, one-step wire bond connection to the contacts on thechip.

One solution to this problem is to use a two-step wire-bondingprocedure, in which the bonding wires are connected to the traces beforethe chip is placed on the component, leaving free ends of the wiresprojecting across the slot or beyond the edges of the dielectricelement. After placing the chip on the connection component, the freeends of the wires remain accessible so that the free ends of the wirescan be bonded to the contacts of the chip in a second bonding step. Thetwo-step bonding process, however, adds to the cost and complexity ofthe assembly procedure, and creates the risk of defects such as adhesivecontamination of the chip contacts or bonding wires during the chipmounting step and misalignment of the free ends of the bonding wireswith the chip contacts.

As disclosed in certain embodiments of co-pending, commonly assignedU.S. Provisional Patent Application 60/508,970, filed Oct. 6, 2003, thedisclosure of which is hereby incorporated by reference herein, aconnection component including posts can be provided with pads exposedat the bottom or outer surface of the dielectric. The component can befabricated by uniting a metallic sheet having posts thereon with adielectric layer as discussed above, so that the metallic sheet isdisposed on the top or inner surface of the dielectric layer and theposts project through the dielectric layer and project beyond the bottomsurface of the dielectric layer. Some of the posts are crushed, abradedor otherwise treated so as to convert these posts to pads which projectonly slightly from the outer or bottom surface of the dielectric. Themetallic sheet is etched to form traces which connect the pads to theposts. The pads may be formed adjacent edges of the dielectric, oradjacent slots in the dielectric. Such a component may be assembled witha chip in face-down orientation, with the contacts of the chip disposedoutside of the edges of the dielectric or in alignment with the slots inthe dielectric. The pads, and hence the traces and posts, can beconnected to the contacts on the chip by a simple, one-step wire-bondingprocedure.

SUMMARY OF THE INVENTION

One aspect of the invention provides connection components for mountingmicroelectronic elements. A connection component according to thisaspect of the invention desirably includes a dielectric layer having anupwardly-facing inside surface and a downwardly-facing outer surface.The connection component desirably has electrically conductive tracesextending on the dielectric layer remote from said outside face as, forexample, on the inside surface or within the thickness of the dielectriclayer. Electrically conductive posts extend from the traces through thedielectric layer and project downwardly beyond the outer surface of thedielectric layer. The component according to this aspect of theinvention desirably includes electrically conductive pads exposed at theoutside face of the dielectric layer, at least some of said pads beingelectrically connected to at least some of said posts by at least someof said traces.

The posts can be used for mounting the component, and hence amicroelectronic element carried by the component, to a circuit panelsuch as a circuit board as, for example, by solder-bonding the ends ofthe posts remote from the dielectric layer to the circuit panel. Thepads can be used for making connections with a microelectronic elementmounted to the component. In a particularly preferred arrangement, thepads are used for wire-bonding. Desirably, the pads are disposed nearedges of the dielectric layer or near a slot or other opening in thedielectric layer.

A further aspect of the invention provides a packaged microelectronicelement including a component as discussed above and a microelectronicelement mounted to the component. The dielectric layer of the componentmost typically overlies the contact-bearing or front surface of themicroelectronic element, and at least some of the contacts of themicroelectronic element are connected to at least some of the pads ofthe component. Most preferably, this connection includes elongated leadssuch as wire bonds extending around the edges of the component orthrough an opening in the component.

A further aspect of the invention provides methods of making connectioncomponents. A method according to this aspect of the invention desirablybegins with a starting structure which includes a dielectric layer andelectrically conductive elements referred to herein as connectors, withan outer electrically conductive layer covering the connectors. Themethod most preferably includes the step of treating the outerelectrically conductive layer so as to remove at least some of thislayer at pad locations while leaving at least some of this layer at postlocations. The treatment thus forms pads and posts incorporating theconnectors. For example, the treating step may be performed so as toremove the entire thickness of the outer conductive layer at the padlocations, thereby forming pads consisting only of the connectors, andto leave the entire thickness of the outer conductive layer at the postlocations, leaving posts which include the connectors together withportions formed from the material of the conductive layer.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagrammatic sectional view depicting elements of aconnection component during one stage in a method according to oneaspect of the invention.

FIG. 2 is a view similar to FIG. 1, but depicting the elements at alater stage during the process.

FIG. 3 is a diagrammatic sectional view of the component formed in theprocess of FIGS. 1 and 2.

FIG. 4 is a diagrammatic sectional view depicting a packagedmicroelectronic element incorporating the component of FIG. 3.

FIG. 5 is a diagrammatic sectional view depicting an assemblyincorporating the packaged microelectronic element of FIG. 4 inconjunction with a circuit board.

FIG. 6 is a diagrammatic plan view of the assembly shown in FIG. 4, withportions removed for clarity of illustration.

FIG. 7 is a diagrammatic sectional view depicting a packagedmicroelectronic element and connection component in accordance with afurther embodiment of the invention.

FIG. 8 is a fragmentary, diagrammatic sectional view depicting a portionof a connection component in accordance with yet another embodiment ofthe invention.

FIG. 9 is a view similar to FIG. 8, but depicting a component accordingto yet another embodiment of the invention.

FIG. 10 is a diagrammatic sectional view depicting a component inaccordance with another embodiment of the invention during a stage in afabrication process.

FIGS. 11 and 12 are diagrammatic sectional views depicting a componentin accordance with a still further embodiment of the invention duringsuccessive stages in formation of such component.

FIG. 13 is a diagrammatic sectional view of an assembly incorporating aplurality of packaged semiconductor chips according to yet anotherembodiment of the invention.

Each of FIGS. 14-17 is a diagrammatic sectional view depicting aconnection component and packaged semiconductor chip in accordance witha further embodiment of the invention.

FIG. 18 is a view similar to FIGS. 14-17, but depicting an assemblyincorporating a packaged microelectronic element in conjunction with anadditional microelectronic element.

DETAILED DESCRIPTION

A method of fabricating a component in accordance with one embodiment ofthe invention utilizes a dielectric layer 22 (FIG. 1) having an insidesurface 24 facing upwardly and an outer surface 26 facing downwardly. Asused in this disclosure, terms such as “upwardly,” “downwardly,”“vertically” and “horizontally” should be understood as referring to theframe of reference of the element specified and need not conform to thenormal gravitation frame of reference. The dielectric layer has holes 28extending between the top and bottom surfaces. The dielectric layer maybe of any thickness, but most typically is about 10-100 μm thick. It maybe a solid, uniform layer such as a layer of a polyimide, BT resin orother material of the type commonly used in forming flexible circuitpanels, or may be a reinforced layer such as a fiberglass-reinforcedepoxy. The dielectric layer may also include internal conductivestructures such as ground planes or layers of traces. Typically, anysuch internal conductive layers are isolated from most or all of theholes 28 so that they do not make contact with conductive elementspositioned in the holes as discussed below.

The process also uses an electrically-conductive inner conductive layer30, desirably formed from a metal such as copper or a copper-basedalloy, most typically about 5-50 μm thick. Layer 30 is a unitarystructure having projections 32 referred to herein as “connectors”formed integrally with the remainder of the layer and extending from oneside of the layer. Connectors 32 are disposed in a pattern correspondingto the pattern of holes 28 in the dielectric layer. A planar outerconductive layer 34, formed from an etchable conductive material,desirably a metal such as copper or a copper-based alloy, is alsoemployed. Outer conductive layer 34 most typically is about 50-300 μmthick.

In one stage of the process, the conductive layers and dielectric layersare laminated to form an in-process structure 36 (FIG. 2). Thelamination process is performed so that connectors 32 extend throughholes 28 in the dielectric layer 22 and abut outer layer 34. To assureabutting contact, the height of projections 32 prior to lamination maybe slightly greater than the thickness of dielectric layer 22, and thelayers are squeezed together in a press or nip so that the projections32 are slightly flattened by engagement with outer layer 34. Mostpreferably the abutting surfaces of the projections 32 and layer 34 arebonded to one another. For example, these surfaces may be bonded byapplying an electrically current between layers 30 and 32 to performelectrical resistance welding at the abutting surfaces. Also, sonic orultrasonic energy may be applied to promote welding of connectors 32 andouter layer 34. Alternatively or additionally, the abutting surfaces ofconnectors 32, layer 34, or both may be provided with thin layers ofbonding materials (not shown) such as eutectic bonding alloys or solder,which are activated during the bonding process.

In the in-process unit 36, inner conductive layer 30 adheres to theupper surface of dielectric layer 24. Such adhesion may be provided by alayer of adhesive (not shown) carried on one of these layers.Alternatively, the dielectric layer may be provided in a partially-curedstate and further cured in contact with layer 30 during the laminationprocess. Although the individual layers are depicted separately in FIG.1, the dielectric layer 22 most typically is carried into the laminationprocess on inner layer 30 or on outer layer 34. For example, thedielectric layer may be provided with holes 28, as by ablating, punchingor etching a continuous dielectric layer to form the holes, and thenlaminated to the outer conductive layer. Alternatively, dielectric layer22 may be formed in place on either conductive layer, as by coating theconductive layer with a liquid precursor and then curing the precursorto form the dielectric. Where the dielectric is a photosensitivematerial, such as a photosensitive material of the type commonly used asa solder mask on electronic components, the holes 28 may be formed byphotographically patterning the dielectric. In a further variant, acompletely or partially cured solid dielectric layer without pre-formedholes may be forcibly engaged with an inner or outer conductive layerbearing connectors so that the connectors penetrate through thedielectric layer. The connectors may be formed with sharp points orsharp edges to facilitate this process.

In-process unit 36 (FIG. 2) thus has inner and outer conductive layers30 and 34 connected with one another by connectors 32 extending throughthe dielectric layer 22 disposed between the conductive layers.

In a further stage of the process, the outer conductive layer 34 of thein-process unit is treated. In this treatment step an etch-resistantmaterial such as a photoresist 38 is applied on the outer surface 40 ofthe layer at locations 42, referred to herein as “post locations,”aligned with some of the connectors 32. The etch-resistant material isomitted at locations other than the post locations. In particular,locations 44, referred to herein as “pad locations,” aligned with otherconnectors 32, are not covered by the etch-resistant material. Theetch-resistant material may be applied by conventional photographicpatterning procedures. After application of resist 38, the outer surface40 of layer 34 is exposed to an etchant which attacks the material oflayer 34. The etchant exposure is continued for a time sufficient toremove the entire thickness of layer 34 at locations such as padlocations 44. At post locations 42, the entire thickness of layer 34remains, so as to form a set of posts 48 projecting beyond the outersurface 26 of the dielectric layer by a projection distance D_(P).Merely by way of example, D_(P) may be about 50 to about 300 μm. Eachpost includes an upper portion formed from one of the connectors 30,such as connector 30 a (FIG. 3) and a lower portion 50 formed from thematerial originally present in outer layer 34. The lower portion definesa base surface 52 at the juncture between the upper and lower portions.In the particular embodiment depicted, the base surfaces have horizontaldimensions (in directions parallel to the surfaces of the dielectriclayer) greater than the horizontal dimensions of the upper portions 30 aat such juncture. Stated another way, the horizontal dimensions of thepost increase at the juncture between the upper portion 30 a and thelower portion 50.

At pad locations 44, downwardly-facing surfaces 54 (FIG. 3) ofconnectors 32 are exposed by removal of the outer conductive layer 34(FIG. 2). Thus, connectors 32 form pads with surfaces exposed at theouter or bottom surface 26 of the dielectric layer. In the particularembodiment depicted, the exposed surfaces 54 of the pads 30 b areexactly flush with outer surface 26 of the dielectric layer, but this isnot essential; the exposed surfaces may be recessed relative to outersurface 26, or may project beyond such surface as discussed below. Asused in this disclosure, an electrically conductive feature can beconsidered “exposed at” a surface of a dielectric layer if the metallicfeature is accessible to a contact or bonding material applied to suchsurface. Thus, a metallic feature which projects from the surface of thedielectric or which is flush with the surface of the dielectric isexposed at such surface; whereas a recessed conductive feature disposedin or aligned with a hole in the dielectric extending to the surface ofthe dielectric is also exposed at such surface.

In a further stage of the process, the inner conductive layer 30 ofin-process unit 36 is treated by patterning a further photoresist orother etch-resistant material 56 (FIG. 2) on this layer and thenexposing this layer to an etchant to remove those portions not coveredby the photoresist. The remaining portions of the inner conductive layerform traces 58 (FIG. 3) extending between at least some of the padlocations 44 and at least some of the post locations 42, so that thesetraces electrically connect at least some of pads 30 a with at leastsome of posts 48. Although only two pads 30 b are depicted in thesectional view of FIG. 3, numerous pads desirably are formed in twoparallel, spaced-apart rows extending in the direction into and out ofthe plane of the drawing in FIG. 3. The exposed surfaces 54 of the padsand the surfaces of the posts may be plated with oxidation-resistantmetals such as nickel and gold.

A slot 66 is formed in the central region of the dielectric layer sothat the slot extends between the rows of pads 30 b, and the pads aredisposed adjacent the edges of the slot. Slot 66 may be formed, byexample, by mechanically punching the dielectric layer; by ablating thedielectric layer using a laser or other concentrated energy source; orby chemically etching the dielectric layer. The completed connectioncomponent thus has the configuration shown in FIG. 3, with pads disposedin slot-edge regions adjacent the edges of the slot, whereas the posts48 are provided in other regions of the dielectric layer.

The order of steps used to make the component can be varied from thatdiscussed above. For example, although the steps of treating the outerconductive layer 34 and inner conductive layer 30 have been describedsequentially above for ease of understanding, these steps may beperformed in any order or simultaneously. For example, both the innerand outer conductive layers may be etched simultaneously afterapplication of photoresists 38 and 56 (FIG. 2). Also, the conductivelayer 30 may be in the form of individual conductive features or traces58 when initially united with the dielectric layer. For example, thetraces 58 may be formed by selective deposition on the dielectric layerbefore or after treatment of the outer conductive layer. If the innerconductive layer 30 or traces 58 is formed by deposition on the innersurface 24 before treatment of the outer conductive layer, connectors 32may be formed in the same deposition step. In a further variant, theconnectors 30 (FIG. 1) may be initially formed on the outer conductivelayer rather than on the inner conductive layer. In this case, the outerconductive layer may be treated before or after application of the innerconductive layer or traces. Also, the step of forming a slot in thedielectric layer can be performed before or after the other steps of theprocess. Also, the various steps can be, and most preferably are,conducted while the dielectric layer 22 is part of a larger sheet ortape. Individual connection components as depicted in FIG. 3 can beobtained by severing such a sheet or tape. Most typically, however, theconnection components are left in the form of a sheet or tape untilafter semiconductor chips or other devices are mounted to thecomponents.

Other methods of forming in-process unit 36 (FIG. 2) may be used. Merelyby way of example, layer 22 may be cast or molded around connectors 32as, for example, by engaging the inner conductive layer 30, connectors32 and outer conductive layer 34 in a compression mold or injectionmold, and injecting an uncured dielectric around the connectors so as toform the dielectric layer in place. Alternatively, the dielectric may beapplied as a flowable material and may flow to form a layer surroundingthe connectors under the influence of gravity or under the influence ofcentrifugal force applied in a centrifuge or similar device.

A packaged microelectronic element 68 (FIG. 4) made using the componentof FIG. 3 incorporates a semiconductor chip or other microelectronicelement 70 having a front face 72 and contacts 74 disposed in one ormore rows on the front face. The component and semiconductor chip areassembled so that the dielectric layer 22 of the component overlies thefront face, with the inner surface 24 of the dielectric layer facingtoward the front face of the chip. The rows of contacts 74 on the chipare aligned with the slot 66 in the dielectric layer. A die attach layer75 is provided between the front face of the chip and the inside surfaceof the dielectric layer. Typically, this die attach layer includes adielectric adhesive. Optionally, the die attach layer may include acompliant layer so as to facilitate movement of posts 48 and otherelements of the connection component relative to the chip during testingand service.

The contacts 74 of the chip are connected to pads 62 by wire bonds 76extending through slot 66. After the contacts have been wire-bonded tothe pads, a dielectric encapsulant 78 is applied over the pads and wirebonds and typically fills slot 66, so that the encapsulant covers thecontact 74 on the chip and also contacts the die attach material 75. Anadditional overmold (not shown) may be provided around the chip, so thatthe overmold covers the exposed edges of the chip and, in someapplications, also covers the upwardly-facing rear surface of the chipto provide additional physical protection.

Desirably, the height or projection distance of the encapsulant D_(E)from the bottom or outer surface 26 is less than or equal to the heightor projection distance D_(P) of the posts. Also, the height orprojection distance of the wire bonds 76 is less than D_(P) and lessthan D_(E), so that the wire bonds are entirely covered by theencapsulant. Stated another way, the difference in height or projectiondistance between the pads 30 b and posts 48 is sufficient to accommodatethe thickness of the wire bonds 76 overlying the pads and the thicknessof the encapsulant overlying the wire bonds. The wire-bonding andencapsulation steps may be performed using conventional equipment andprocedures. In particular, the wire-bonding step can be performed in asingle bonding operation using a bonding tool which approaches theassembly from the outer or bottom side 26 of the dielectric layer. Asmentioned above, the components are typically provided in the form of asheet or tape including numerous components. The chips are mounted tothese components and the wire-bonding and encapsulation procedurespreferably are performed while the connection components are in the formof a sheet or tape. After the procedures have been formed, the sheet ortape typically is severed so as to yield numerous individual units, eachincorporating one or more chips.

The packaged chips can be tested by engaging posts 48 with a testfixture (not shown). In some cases, the posts 30 may be displacedvertically towards or away from chip 70 during the testing procedure, soas to assure proper engagement of all of the posts 30 with the testfixture. Such movement can be facilitated by making the dielectric layer22 and traces 58 flexible and by providing compressibility in the dieattach layer 75. In addition, the posts, the dielectric layer and thedie attach layer can be provided with features as shown in theaforementioned co-pending applications 60/533,210; 60/533,393; and60/533,437 to promote movement of the posts and, preferably, tilting ofthe posts during engagement with the test fixture. The testing operationcan be performed before or after severance of the individual units ofthe tape and before or after application of encapsulant 78. If thetesting operation is performed before application of the encapsulant andovermold, defective wire bonds 76, detected in the testing operation,can be reworked.

Packaged microelectronic element 68 may be mounted to a circuit panelsuch as a circuit board 80, partially illustrated in FIG. 5. Posts 48may be bonded to contact pads 82 on the top surface of the circuit boardusing conventional surface-mounting techniques. Preferably, only a thinlayer of a bonding material such as a solder 84 is provided between thetips of the posts and the contact pads. Some of the bonding material mayalso extend upwardly along the posts (not shown), so that the ends ofthe posts remote from dielectric layer 22 are engaged within masses ofbonding material. In the conventional manner, circuit panel 80 includesconductive elements such as traces (not shown) connecting the contactpads 82 with other elements of an electronic circuit. Encapsulant 78remains clear of the circuit board top surface.

In the completed circuit, the posts 48 desirably can move or tiltslightly to accommodate movement of the contact pads 82 on the circuitboard relative to the contact 74 of the chip as may be caused, forexample, by differential thermal expansion and contraction of theelements during operation and contraction during manufacture as, forexample, during the solder bonding process. The posts may also bendslightly to accommodate such movement.

The depictions in FIG. 1-5 are simplified for clarity of illustration.Typically, the component includes more than one row of posts on eachside of the slot. As seen in the bottom plan view of FIG. 6, thedielectric layer 22 may be generally rectangular, and slot 66 may beelongated. One or more rows of pads 30 b are provided in slot-edgeregions adjacent the edges of the slot, whereas numerous rows of posts48 are provided in other regions of the dielectric layer. The pads 30 bare connected to the posts 48 by traces 58 as discussed above. As alsoshown in FIG. 6, each pad may be connected to one or more posts, and theposts may be interconnected with one another by some of the traces. Forclarity of illustration, only a few of the traces 58 are shown in FIG.7. As mentioned above, the dielectric layer 22 may have embeddedconductive features such as ground planes. Further, the conductivefeatures formed in the same operations as traces 58 may also includeother conductive elements as, for example, electrically-conductiveplanes which serve as ground or power planes and which may be connectedto some of the posts and/or pads.

It is not essential to provide the slot in the center of the dielectricelement. Thus, the slot 66 can be offset from the center of thedielectric element. Also, two or more slots can be provided in a singledielectric element. In a further modification, the slot may be replacedby a set of discrete openings, each encompassing one or more of thecontacts 74 on the chip, and the wire bonds may extend through theseopenings.

A packaged chip 168 (FIG. 7) in accordance with a further embodiment ofthe invention includes a connection component having a dielectric layer122, pads 130 b, posts 148 and electrically-conductive features such astraces 158 fabricated in substantially the same manner as discussedabove and similar to the corresponding features discussed above. In thisembodiment, however, the dielectric layer has opposed edges 102 and 104,and the pads 130 b are formed in edge regions of the dielectric layeradjacent these edges. In this embodiment as well, a chip or othermicroelectronic element 170 is mounted with its front or contact-bearingface facing downwardly toward the dielectric element. The chip hasopposed edges 106 and 108, and edge regions of the chip front surfaceproject outwardly beyond edges 102 and 104 of the dielectric layer. Thecontacts 174 of the chip are disposed in these edge regions of the chipfront surface as, for example, by providing one or more rows of contactsin each edge region. The wire bonds 176 extend from the contacts 174 andextend around the edges 102 and 104 of the dielectric element. Anencapsulant 178 covers the wire bonds and covers the edge regions of thechip and the edge regions of the dielectric element. In a furthervariant, the encapsulant may also cover the edges of the chip so as toprovide physical protection to the edges of the chip. Alternatively, afurther overmold may be provided around the chip. It is not essential toprovide pads and wire bonds at only two opposed edges. For example, thepads and wire bonds may be provided at four edges of a rectangulardielectric element, and the chip may have edge regions extending beyondall of those edges. Conversely, the chip may extend beyond only one edgeof the dielectric element, and pads may be provided only at that edge.Also, the edge pad approach exemplified in FIG. 7 may be combined withthe slot edge pads as shown in FIG. 6 so that pads are provided both atthe outer edges of the dielectric element and along the edges of one ormore slots in the dielectric element.

In the embodiments discussed above, the pads have exposed surfacessubstantially flush with the outer or bottom surface of the dielectricelement. However, as shown in fragmentary sectional view in FIG. 8, thepads may have exposed surfaces 254 recessed above the outer surface 226of the dielectric element. Pads of this type can be fabricated using anetching process similar to that discussed above with reference to FIGS.2 and 3 to treat the outer conductive layer, except that the etchingstep is continued for a time beyond that required to fully remove theouter conductive layer at the pad locations. The recessed pads provide agreater differential between the height of the pads and the height ofthe posts, and hence provide increased clearance for the thickness ofwire bonds and encapsulant. The thickness of the pads can be reducedfurther, and indeed can be reduced to zero so that the exposed surfacesof the pads are defined by surfaces 255 of the leads themselves, exposedat the bottom surface 226 through the holes 228 in the dielectric layerat the pad locations. Such a configuration may be used, for example, ina component having a thin dielectric layer so that even with azero-thickness pad, the exposed surfaces 255 are close enough to thebottom surface 226 of the dielectric layer for wire-bonding.

Conversely, the component of FIG. 9 includes pads 330 b extendingdownwardly from the outer surface 326. The pads, and particularly theexposed surfaces 354 of the pads, thus project downwardly beyond theouter surface. The posts 348 include upper portions 330 a which projectbelow the outer surface 326, so that the base surfaces 352 of the postsstand off from the outer surface of the dielectric layer. Here again,the height of the posts exceeds the height of the pads, so that wirebonds and encapsulant (not shown) can be accommodated. Components ofthis configuration may be made, for example, by initially making theconnectors with a height greater than the thickness of the dielectriclayer, and providing the connectors with an etch-resistant layer so thatthe connectors will not be attacked substantially by the etchant used toremove portions of the outer conductive layer and form the posts.

In the embodiments discussed above, the entire thickness of the outerconductive layer, such as layer 34 (FIGS. 2 and 3) is removed at the padlocations 44. However, this is not essential; a part of the thickness ofthe outer conductive layer may be left in place at the pad locations, sothat a portion of the outer conductive layer is left as a part of eachpad. For example, spots of an etch-resistant material can be applied atthe pad locations after the outer conductive layer has been etched to acertain extent. Alternatively, the outer conductive layer may beprovided as a composite layer including two layers of copper or otherreadily etched conductive material with spots of an etch-resistantmaterial such as gold disposed between these layers at the padlocations. In this case, the etching process will be arrested at the padlocations when it reaches the boundary between the layers.

Also, in the processes discussed above, the entire thickness of theouter conductive layer remains in place at the post locations, so thatthe posts have projection distance D_(P) (FIG. 3) equal to the originalthickness of the outer conductive layer 34 (FIGS. 1 and 2). However,this is not essential; some portion of the original thickness of theouter conductive layer may be removed during treatment. Stated anotherway, none or some of the thickness of the outer conductive layer may beremoved at the post locations, and some or all of thickness of the outerconductive layer may be removed at the pad locations. However, it isdesirable to remove more of said outer conductive layer at the padlocations than at post locations, so as to leave the posts projectingdownwardly beyond the pads.

In the discussion above, the posts have been idealized as substantiallyfrustoconical elements. However, it is not essential for the posts tohave this shape. As seen in FIG. 10, and as discussed in greater detailin the aforementioned U.S. Pat. No. 6,177,636, posts may be formed byapplying an etch-resistant material, which may be a photoresist or acorrosion-resistant metal such as nickel, gold or the like, on a surface404 of a metallic plate or sheet. After application of theetch-resistant material, an etchant is applied to this surface,typically in the form of a spray directed normal to the surface 404. Themetal of the plate or sheet may be etched to form posts 448 having theconfiguration shown in broken lines in FIG. 11. In this configuration,the lower portions 450 of posts 448 have a “cooling tower” shape. Eachsuch lower portion has a base 452 connected to the upper portion 430 a,a tip 433 remote from the base and an intermediate portion 435 betweenthe base and tip. The intermediate portion 435 is narrower than the tipportion 433 and narrower than the base 431, so that the post tapersinwardly in the direction from the base to the intermediate portion andtapers outwardly from the intermediate portion to the tip. Where spots402 of the etch-resistant material are round, the posts typically havethe shape of bodies of revolution about axes 437 extending normal tosurface 404 and normal to the surface of remaining portion 428. Wherethe etch-resistant material 402 is a photoresist or other material whichis not desired in the final product, the etch-resistant material may beremoved before further processing. Alternatively, if the etch-resistantmaterial is a corrosion-resistant metal such as nickel or gold, it maybe left in place.

A further embodiment of the invention provides, elongated posts 548(FIG. 12). In one stage of the post-forming process, a first set of postportions 550 (FIG. 11) projecting from a surface 526 such as a surfaceof a dielectric element. Post portions 550 may be formed by any process,but desirably are formed by a process as discussed above. Afterformation of portions 550, a metallic or other conductive layer 502 isapplied over the tips 533 of post portions 550. Layer 502 is selectivelytreated so as to remove material of the layer remote from post portions550, but leave at least part of the layer thickness overlying postportions 550, and thereby form additional post portions 504 (FIG. 12)aligned with post, portions 550. The treatment applied to layer 502 mayinclude an etching process as discussed above, using spots of anetch-resistant material 506 aligned with post portions 550. A protectivelayer such as a dielectric encapsulant 508 may be applied to cover postportions 550 before etching layer 502. Alternatively or additionally,post portions 550 may be plated or otherwise covered with anetch-resistant conductive material such as nickel or gold before etchinglayer 502.

The process of building up successive post portions may be repeated soas to form additional portions below portions 504, so that posts ofessentially any length can be formed. The long posts provide increasedflexibility and movement of the post tips. Where one or more dielectricencapsulant layers are left in place around the already-formed postportions, such as layer 508 in FIGS. 11 and 12, the encapsulantdesirably is compliant so that it does not substantially limit flexureof the posts. In other embodiments, the encapsulant is removed beforethe components are used. Although the posts are illustrated inconjunction with a dielectric substrate 522 and traces 528 similar tothose discussed above, this process can be used to fabricate posts foressentially any structure.

The connection components discussed above can be utilized in assemblieswhich are mated with sockets rather than surface-mounted to a circuitboard. For example, a packaged semiconductor chip as discussed above canbe mounted to a socket, with each of the posts extending into a matinghole in the socket and making electrical contact with a contact of thesocket. Certain suitable sockets are described in embodiments of U.S.Pat. Nos. 5,802,699; 5,980,270 and 5,615,824, the disclosures of whichare incorporated by reference herein. In a further alternative, thesocket arrangement can be used as a temporary test fixture and, aftertesting, the assembly can be solder-bonded or otherwise bonded to acircuit board. In still further arrangements, the components can be usedas elements of stacked assemblies. For example, the assembly depicted inFIG. 13 includes several packaged microelectronic elements 668 a, 668 band 668 c, each similar to the packaged element 68 of FIG. 4, stackedone above the other, so that each such packaged microelectronic elementserves as a single unit in a multi-unit stacked assembly. Each unit hasupwardly-facing conductive elements, such as portions of traces 658projecting beyond chips 670 and, exposed at the upper or inner surface624 of the dielectric element. The upwardly-facing conductive elementsof unit 668 c are connected to the posts 648 of the next higher unit 668b in the stack, whereas the upwardly-facing conductive elements of unit668 b are connected to the posts 648 of unit 668 a, so that the postsserve as vertical interconnection elements between the various units.Other features of stacked packages are described, for example, in U.S.Patent Publications 20030107118A1 and 20040031972A1, the disclosures ofwhich are incorporated by reference herein.

Features other than posts and pads can be made using the processesdiscussed herein. For example, a thermally conductive element may beprovided by leaving some or all of the thickness of the outer conductivelayer during an etching or other treatment step as discussed above. Sucha thermally conductive element may have a height equal to the height ofthe posts, and may have a cross-sectional area greater than thecross-sectional area of an individual post. The use ofthermally-conductive elements is described in greater detail in theco-pending, U.S. Provisional Application No. 60/583,066, filed Jun. 25,2004, entitled “MICROELECTRONIC PACKAGES AND METHODS THEREFOR,” namingBelgacem Haba as an inventor, the disclosure of which is incorporated byreference herein.

The assemblies discussed above include relatively simple components withonly a single layer of conductive traces, discussed above. However, morethan one layer of traces can be used, and other conductive features suchas conductive planes can be included. For example, as shown in FIG. 14,a component with plural layers of traces may be formed with anadditional dielectric layer 702 having additional traces 704 andadditional connectors 706 extending through such additional dielectriclayer to conductive features such as traces 758 on a first dielectriclayer 722. The additional dielectric layer 702 desirably is laminated tothe first dielectric layer after formation of the traces 758 on thefirst dielectric layer; this may occur before or after formation ofposts 748 and before or after lamination of the first dielectric layerwith the outer conductive layer used to form the posts. In theembodiments discussed above, the traces, such as traces 58 (FIGS. 3-5)extend along a surface of the dielectric layer. However, this is notessential; traces or other conductive features can be disposed within adielectric layer. For example, in FIG. 14, traces 758 extend within acomposite dielectric layer incorporating layers 702 and 722. As used inthis disclosure, when a conductive element is said to be “on” adielectric element or layer, the conductive element need not be disposedon a surface of the dielectric, but instead, may be disposed within thedielectric. That is, the word “on” does not imply location at a surfaceof a dielectric.

In the embodiments discussed above, the chip or other microelectronicelement is disposed in face-down orientation, with the contact-bearingsurface facing the dielectric element. However, the connectioncomponents made in accordance with the invention can be used to mountmicroelectronic elements in face-up orientation. For example, as seen inFIG. 15, the packaged microelectronic element includes a chip 870 havingcontacts 874 on a front surface 872. Front surface 872 faces upwardly,away from the dielectric element and traces. Wire bonds 876 extenddownwardly from contacts 874 to traces 858, which in turn are connectedto posts 848 as discussed above. In this embodiment, it is not necessaryto provide pads exposed on the outer or downwardly-facing surface of thedielectric layer. The process of making the connection component can beperformed in substantially the same way as discussed above, except thatconnectors are not provided at pad locations as discussed above withreference to FIGS. 2 and 3. In a further variant (FIG. 16), the chip 871has contacts 873 on a downwardly-facing surface, but the contacts areconnected to the leads by masses of solder or other bonding material875, commonly referred to as a “flip-chip” mounting. In this embodimentas well, exposed pads are not required.

In a further variant, (FIG. 17) the traces 958 formed from the innerconductive layer include lead portions 959 formed integrally with thetraces. These lead portions as initially formed project partially orcompletely across a slot 966 in the dielectric element, so that they canbe bonded to the contacts 974 of a microelectronic element, such as achip 970 disposed in face-down orientation. In a further variant, thelead portions may project beyond one or more edges of the dielectricelement, so that the lead portions can be bonded to contacts onprojecting edges of a chip, such as the contacts 174 shown in FIG. 7.

In yet another variant (FIG. 18), the connection component has bothposts 1048 and pads 1030 exposed at the bottom or outer surface 1026 ofdielectric element 1022. As in the embodiment discussed above withreference to FIGS. 1-5, the posts 1048 project downwardly beyond thepads. A microelectronic element such as a chip 1070 is mounted below thedielectric element, and is connected to pads 1030 by solder elements1002 or other bonding technique. This microelectronic element isconnected by the pads to traces 1058. A further microelectronic element1071 optionally is provided above the dielectric element, and isconnected to traces 1058 by flip-chip bonding using solder elements1004. Depending on the configuration of the traces, the traces mayconnect either or both of chips 1070 and 1071 to posts 1048, and mayconnect the chips to one another. In this embodiment, the difference inheight between the pads and the posts provides room form mounting thebottom chip 1070; the bottom chip does not project below the tips of theposts, and thus does not interfere with connection between the posts anda circuit panel. In other embodiments, some of the pads on thedielectric element may be used to make connections to a chip or otherelement disposed above the dielectric element, as by a wire-bondingprocess, whereas other pads may be connected to a chip disposed belowthe dielectric element.

As these and other variations and combinations of the features discussedabove can be utilized without departing from the present invention asdefined by the claims, the foregoing description of the preferredembodiments should be taken by way of illustration rather than by way oflimitation of the invention as defined by the claims.

1. A method of making a connection component including the steps of:removing portions of an outer electrically conductive layer covering anouter surface of a dielectric layer and covering electrically conductiveconnectors on said dielectric layer so as to remove at least some ofsaid outer electrically conductive layer at pad locations and leave atleast some of said outer layer at post locations and thereby form padsat said pad locations and posts at said post locations, said pads andsaid posts incorporating said connectors, said pads having downwardlyfacing surfaces exposed at said outer surface, said posts projectingdownwardly from said outer surface of said dielectric layer andprojecting downwardly beyond said surfaces of said pads; and treating aninner electrically conductive layer remote from said outer electricallyconductive layer and connected to said pads so as to remove portions ofsaid inner electrically conductive layer and form electricallyconductive traces connecting at least some of said pads with at leastsome of said posts.
 2. The method as claimed in claim 1 wherein saidstep of removing portions of said outer electrically conductive layerincludes removing the entire thickness of said outer electricallyconductive layer at the pad locations.
 3. The method as claimed in claim1 wherein said step of removing portions of said outer electricallyconductive layer includes leaving the entire thickness of said outerelectrically conductive layer at said post locations.
 4. The method asclaimed in claim 1 wherein said step of removing portions of said outerelectrically conductive layer includes etching said outer electricallyconductive layer.
 5. The method as claimed in claim 4 wherein saidetching step is performed so as to remove the entire thickness of saidouter electrically conductive layer at said pad locations and therebyexpose connectors at said pad locations, the method further comprisingcontinuing said etching step after the connectors are exposed so as toremove portions of said connectors, wherein said downwardly-facingexposed surfaces of said pads are recessed above said outer surface ofsaid dielectric layer.
 6. The method as claimed in claim 1 wherein saidinner and outer electrically conductive layers are metallic layers andsaid steps of treating said inner and outer metallic layers includesimultaneously etching both of said metallic layers.
 7. The method asclaimed in claim 1 further comprising the step of joining said inner andouter electrically conductive layers, said connectors and saiddielectric layer prior to said step of treating said outer metalliclayer.
 8. The method as claimed in claim 7 wherein said joining stepincludes providing the dielectric layer with holes extending betweensaid outer surface and said inner surface and laminating saidelectrically conductive layers and said dielectric layer, one of saidelectrically conductive layers having said connectors thereon so thatsaid connectors are positioned in said holes during said laminatingstep.
 9. The method as claimed in claim 8 wherein said innerelectrically conductive layer has said connectors formed integrallytherewith.
 10. A method of making a connection component including thestep of removing portions of an outer electrically conductive layercovering an outer surface of a dielectric layer and coveringelectrically conductive connectors on said dielectric layer, an innerelectrically conductive layer extending along a major surface of saiddielectric layer remote from said outer surface, said connectorsextending from said inner electrically conductive layer through saiddielectric layer, so as to remove at least some of said outerelectrically conductive layer at pad locations and leave at least someof said outer layer at post locations and form electrically conductivepads at said pad locations and electrically conductive posts at saidpost locations, said pads and said posts extending from said innerelectrically conductive layer, said pads and said posts incorporatingsaid connectors, said pads having downwardly facing surfaces exposed atsaid outer surface, said posts projecting downwardly from said outersurface of said dielectric layer and projecting downwardly beyond saidsurfaces of said pads.
 11. A method as claimed in claim 10, wherein atleast one of said pads is adapted for at least one of solder-bonding orwire-bonding to a microelectronic element.
 12. A method as claimed inclaim 10 wherein at least one of said pads is electrically connectedwith at least one of said posts.
 13. The method of claim 10, whereinsaid step of removing portions of said outer electrically conductivelayer includes etching said outer electrically conductive layer.
 14. Themethod of claim 10, wherein said inner and outer electrically conductivelayers are metallic layers and said steps of treating said inner andouter metallic layers include simultaneously etching both of saidmetallic layers.
 15. A method of making a connection component includingthe step of removing portions of an outer electrically conductive layercovering an outer surface of a dielectric layer and coveringelectrically conductive connectors on said dielectric layer so as toremove at least some of said outer electrically conductive layer at padlocations and leave at least some of said outer layer at post locationsand thereby form pads at said pad locations and posts at said postlocations, said pads and said posts incorporating said connectors, saidpads having downwardly facing surfaces exposed at said outer surface,said posts projecting downwardly from said outer surface of saiddielectric layer and projecting downwardly beyond said surfaces of saidpads, wherein the step of removing portions of said outer electricallyconductive layer includes etching said outer electrically conductivelayer, so as to remove the entire thickness of said outer electricallyconductive layer at said pad locations and thereby expose connectors atsaid pad locations, the method further comprising continuing saidetching step after the connectors are exposed so as to remove portionsof said connectors, wherein said downwardly-facing exposed surfaces ofsaid pads are recessed above said outer surface of said dielectriclayer.